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Optical-Grade Lithium Niobate Crystal Substrate
Optical-grade lithium niobate crystal substrate is a high-quality functional crystal material with excellent electro-optic, acousto-optic, piezoelectric, and nonlinear optical properties. It is widely used in optical communications, integrated photonics, surface acoustic wave devices, optoelectronic technology, and other fields. The product offers two material types: congruent lithium niobate (CLN) and stoichiometric lithium niobate (SLN), with good crystal quality, optical uniformity, and surface processing performance. It supports 3-inch, 4-inch, 6-inch, and 8-inch round wafers, as well as square, triangular, and custom special-shaped sizes. Processing options include single-side polishing, double-side polishing, and single-side polishing with the other side ground/lapped, meeting diverse needs for optical experiments, LNOI thin-film preparation, electro-optic modulation, and precision optoelectronic devices.
Product features:Excellent optoelectronic performance;High-quality crystal substrate;Flexible customization in multiple specifications;Precision surface processing
Part Number:MP-LN-SUB
Application area:Optical communications and electro-optic modulation | LNOI thin films and integrated photonics | Acousto-optic and RF acoustic devices | Nonlinear optics and scientific research experiments
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Standard thickness Surface quality
350 μm, 500 μm, 1000 μm, customizable S/D 20/10 (reference specification for double-side polishing)

Parameter | Specification |
Material Type | Congruent Lithium Niobate (CLN), Stoichiometric Lithium Niobate (SLN) |
Crystal Structure | Trigonal Crystal System |
Crystal Orientation | X-cut, Y-cut, Z-cut, Y36°-cut, customizable |
Wafer Diameter | 3 inch (76.2 mm), 4 inch (100 mm), 6 inch (150 mm), 8 inch (200 mm) |
Product Shape | Round, square, triangular, custom special-shaped |
Wafer Thickness | 350 μm, 500 μm, 1000 μm, customizable |
Thickness Tolerance | Customized according to dimensions and processing requirements |
Primary Orientation Flat (OF) | 22 ± 2 mm, 32 ± 2 mm, 47 ± 2 mm (selected according to specification) |
Secondary Orientation Flat (RF) | 14 ± 3 mm (for applicable specifications) |
Surface Processing | Single-Side Polished (SSP), Double-Side Polished (DSP), single-side polished with the other side lapped/ground |
Surface Quality | S/D 20/10 (reference specification) |
Surface Roughness (Ra) | ≤ 0.3 nm (reference specification) |
Total Thickness Variation (TTV) | ≤ 10 μm (reference specification) |
Warp (WARP) | ≤ 3 μm (3-inch reference specification) |
Ordinary Refractive Index (No) | 2.2878±0.0001 (λ= 632.8nm) |
Extraordinary Refractive Index (Ne) | 2.2028±0.0001(λ=632.8nm) |
Curie Temperature | Approx. 1142℃(CLN) |
Edge Treatment | Chamfered edge, customizable |
Internal Crystal Quality | No obvious striations, inclusions, or other defects |
Main Applications | Optical communications, electro-optic modulation, LNOI thin-film substrates, acousto-optic devices, SAW devices, nonlinear optics, RF acoustic devices, optical experiments |
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