IdealPhotonics' PLD diode is based on a thin-film fabrication technology using high-energy pulsed lasers (typically KrF/ArF excimer lasers or Nd:YAG lasers) to bombard targets. It achieves atomic-level material exfoliation and deposition in a vacuum/reactive gas environment using nanosecond-level pulses (energy density 1-10 J/cm²). Its innovative "dual-beam synchronous control" system can fabricate various functional thin films, including superconducting (e.g., YBCO), ferroelectric (e.g., PZT), and two-dimensional materials (e.g., graphene). These films exhibit high compositional fidelity (>99%) and film thickness control precision down to a single atomic layer (±0.01 nm), making them a core fabrication tool in cutting-edge fields such as quantum devices and flexible electronics.Employing high-energy pulsed lasers (such as 248nm KrF or 193nm ArF) and multi-target synergistic sputtering technology, atomic-level precision (±0.005nm) thin film deposition is achieved in an ultra-high vacuum environment of 10⁻⁶ Pa. Its innovative "real-time plasma spectral monitoring" system enables the control of compositional deviations in multi-component oxides (such as YBCO superconducting films).