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  • High-Numerical-Aperture Ultra-High-Vacuum Glass Cell

    The MP-HN-10-13-60 is an ultra-high-vacuum (UHV) glass cell designed for quantum technologies, cold atom experiments, atomic imaging, and precision optical research. Manufactured from high-optical-quality borosilicate glass, the cell is compatible with common microscope objectives of numerical apertures (NA) 0.3, 0.5, and 0.7, providing large-area, high-quality optical access to the interior of the vacuum system. The large optical windows feature excellent parallelism and surface figure accuracy, significantly reducing aberrations and distortions when optical beams pass through the cell, making it ideal for high-resolution imaging, beam projection, atom manipulation, and laser cooling applications. The cell is assembled using an epoxy-free and frit-free bonding process, ensuring low outgassing, high-temperature bake-out capability, and excellent UHV compatibility.

    Product features:UHV‑compatible glass cell;Compatible with 0.3, 0.5, and 0.7 NA microscope objectives;High parallelism of optical windows to reduce astigmatism;Surface figure accuracy better than λ/4;Supports vacuum bake‑out up to 300 °C;Epoxy‑free and frit‑free bonding construction;Low outgassing rate, suitable for UHV systems;Supports narrowband AR, broadband AR, and uncoated configurations;Custom optical coatings supported

    Part Number:MP-HN-10-13-60

    Application area:Cold and ultracold atom experiments | Quantum simulation and quantum computing | Magneto-optical trap (MOT) experiments | High-resolution imaging of atomic gases | Optical lattices and optical tweezers systems | Laser cooling and atom trapping | Atom interferometry | Precision spectroscopy experiments | In-cavity beam projection | High-NA microscopy imaging | UHV optical experimental platforms

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    Main parameters
  • Core parameters
  • Outer Dimensions Wall Thickness Optical Flatness

    17 × 20 × 63.5 mm 3.5 ± 0.05 mm < λ/4 per 10 mm diameter aperture (PV flatness)

  • Dimension Drawing
  • General Parameters

    Parameter

    Specification

    Outer Dimensions (W × D × L)

    17 × 20 × 63.5 mm

    Inner Dimensions (W × D × L)

    10 × 13 × 60 mm

    Wall Thickness

    3.5 ± 0.05 mm

    Optical Flatness

    < λ/4 per 10 mm diameter aperture (PV flatness)

    Coating Options

    • IBS targeted (H) AR coating for rubidium, cesium, potassium, sodium at 767 nm, 780 nm, 790 nm, 852 nm, and 1064 nm

    • IBS broadband (K) AR coating with minimal reflectance from 450 nm to 1070 nm

    • Uncoated

    • Custom coatings available

    Cell Material

    Borofloat®‑33 (borosilicate glass)

    Surface Quality (Scratch/Dig)

    20‑10

    Bake‑Out Temperature

    ≤ 300 °C

    Ramp Up/Down Rate

    1 °C/min

    Flange Width (Conflat Type)

    DN16 (1.33″, 33.78 mm)

    DN40 (2.75″, 69.85 mm)

    Flange Height

    48 ± 2 mm


    Optional Configurations

    --

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  • Product title: High-Numerical-Aperture Ultra-High-Vacuum Glass Cell
  • Product link: https://www.idealphotonics.com/product/detail/1618.html
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