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Infrared Nanosecond Laser
The nanosecond laser features a highly integrated, compact all-in-one design. While delivering high output power and single-pulse energy, it also provides excellent beam quality and power stability. It can be flexibly matched to various types of equipment platforms and industrial processing scenarios. The product covers three wavelength bands - infrared, green, and ultraviolet - and offers a wide range of power configurations from 5 W to 60 W, meeting application requirements such as laser marking, glass atomization, ITO thin-film etching, and solar silicon wafer grooving and cutting.
Product features:Highly integrated, compact all‑in‑one design;Higher power and larger pulse energy; Excellent beam quality;High output stability;Wide power coverage
Part Number:MP-NSIR-1064-50
Application area:Laser marking | Glass atomization | ITO thin-film etching | Solar silicon wafer grooving and cutting
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Wavelength Average Power Repetition Rate
1064 nm ≥50 W 100–200 kHz

Parameter | Value |
Typical wavelength | 1064 nm |
Repetition rate | 100–200 kHz |
Pulse width | <13 ns |
Average power | ≥50 W |
Maximum pulse energy | ≥0.5 mJ |
Beam quality M² | <1.3 |
Output beam diameter | ≈2 mm |
Output beam divergence (full angle) | <2 mrad |
Average power stability | RMS < 1.5% |
Cooling method | Water‑cooled |
Product Dimension Drawing
Typical Beam Quality
Typical Beam Spot
High‑Power RMS Power Stability Test Results

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