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Research-Grade High-Repetition-Rate Deep-Ultraviolet Picosecond Laser
The high-repetition-rate UV and deep-UV picosecond laser is a research-grade ultrafast light source developed for semiconductor inspection, precision spectroscopy analysis, and micromachining applications. It provides dual-wavelength output at 266 nm (deep UV) and 355 nm (UV), with a pulse width of 10 ps and a maximum repetition rate of 120 MHz. The high-repetition-rate output meets the demand for high-frequency, stable laser sources in semiconductor inspection and similar applications.
Product features:120 MHz high repetition rate; 266 nm deep‑UV wavelength;10 ps ultrashort pulse;Excellent beam quality;Long-life design
Part Number:MP-DUV-PL-266-4
Application area:Semiconductor material surface inspection | Laser-induced breakdown spectroscopy | Laser-induced fluorescence (LIF) | UV Raman spectroscopy
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Wavelength Average Power Repetition Rate
266 nm ≥4 W 120 MHz

Parameter | Value |
Typical wavelength | 266 nm |
Repetition rate | 120 MHz |
Pulse width | 10 ps |
Average power | ≥4 W |
Beam quality M² | < 1.3 |
Polarization extinction ratio | > 100:1 |
Output beam diameter | 3 mm |
Output beam divergence (full angle) | < 0.25 mrad |
Average power stability | RMS < 1% |
Cooling method | Water‑cooled |
Product Dimension Drawing
Typical Beam Quality
Typical Beam Spot
High‑Power RMS Power Stability Test Results

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